Sonosys
Megasonic Single-/Dual-/Triple-Nozzle, Concentration on the essentials – contact-less cleaning
SONOSYS® offers solutions in the field of ultrasonic and megasonic cleaning for various applications. The focus hereby is on higher frequencies (between 400 kHz and 5 MHz) for cleaning the smallest particles and contaminants, right down to the nanometer range. The megasonic products are developed entirely in-house and range from the generator and transducer plates with patented piezo ceramics up to submersible transducers and single and dual nozzles. After its founding in 1995 the R&D and production was scaled up continuously to a wide product portfolio and to become a European leader in Megasonics technology.
Brand
Concentration on the essentials – contact-less cleaning
The transducer in the Megasonic Nozzle generates a Megasonic wave, which is transmitted through a flowing liquid (e.g.: DI-water) to the surface of the substrate. The Megasonic energy is concentrated on a small point of 2 or 4 mm.
SONOSYS® Megasonic nozzles are offered in the frequencies of NEW: 600 kHz / 1 MHz / 2 MHz / 3 MHz / 4 MHz and 5 MHz.
This tankless Megasonic Nozzle system provides advanced non contact cleaning processes.
Application:
Cleaning of Single Wafers, Masks, LCD‘s, Substrates and Micro Electro Mechanical Systems (MEMS), and with 600 kHz also larger particles in the optic industry, from medical devices and sensors.