大面積樣品濺鍍系統 /
Large Sample Sputter System
產品類型 / Product Type：
大面積樣品濺鍍系統 /
Large Sample Sputter System
產品應用 / Application：
相關網址 / Link：
規格說明 / Specification：
The K675X has a triple magnetron target assembly which, together with a rotating specimen table, ensures even deposition of large specimens. It is not possible to sequentially sputter three different metals from each of the three sputtering heads (for sequential coating of two metals, see the K675XD). However, with the individual head selection option (EK4125) the operator can choose to sputter using all three of the heads, or, for economical sputtering of small specimens, a single head can be selected.
Sputtering parameters (current and sputtering time) can be pre-set. The K675X can sputter noble metals such as gold (Au), platinum (Pt), palladium (Pd) etc and also target materials such as chromium (Cr) and aluminium (Al) that may need pre-cleaning to remove oxide layers. A triple shutter assembly is fitted to protect specimens during the target cleaning stage.